Process Trend Monitoring Based on Key Sensitive Index: Applications Semiconductor Manufacturing
Jyh-Cheng Jeng, An-Jhih Su, Hsiao-Ping Huang and Cheng-Ching Yu, Chemical Engineering, National Taiwan University, Taipei, 106-17, Taiwan |
Statistical Fault Detection of Batch Processes in Semiconductor Manufacturing
Qinghua (Peter) He, Department of Chemical Engineering, Tuskegee University, Tuskegee, AL 36088 and Jin Wang, Department of Chemical Engineering, Auburn University, Auburn, AL 36849 |
Real-Time Thin Film Characterization during Chemical Vapor Deposition Using Moving Horizon Estimation
Rentian Xiong, School of Chemical & Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, N.W., Atlanta, GA 30309 and Martha Gallivan, School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, GA 30332-0100 |
Industrial Implementation of on-Line Multivariate Quality Control (Part II: Long-Term Performance, Model Maintenance, and Model Leveraging)
Leo H. Chiang, The Dow Chemical Company, Corporate R&D, 2301 Brazosport Blvd., B1463, Freeport, TX 77584, U.S.A. and Lloyd Colegrove, The Dow Chemical Company, 2301 Brazosport Blvd., B7503, Freeport, TX 77584 |
Evolving Models and a Pls Similarity Factor for Monitoring Batch Processes
Jon C. Gunther and Dale E. Seborg, Chemical Engineering, UC-Santa Barbara, Santa Barbara, CA 93105 |
Bio-Reactor Monitoring with Multiway-Pca and Model Based-Pca
Yang Zhang, Department of Chemical Engineering, The University of Texas at Austin, 1 University Station; Mail Code C0400, Austin, TX 78712 and Thomas F. Edgar, Chemical Engineering, Dept. of Chem. Eng.,The University of Texas at Austin, 1 University Station Stop C0400, Austin, TX 78712 |
Variance Component Analysis Based Fault Diagnosis of Multi-Layer Overlay Lithography Processes
Jie Yu and S. Joe Qin, Department of Chemical Engineering, The University of Texas at Austin, 1 University Station C0400, Austin, TX 78712 |
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